{"id":29260,"date":"2010-10-06T04:07:49","date_gmt":"2010-10-06T04:07:49","guid":{"rendered":"https:\/\/nano2.toolsmkt.com\/?p=382"},"modified":"2010-10-06T04:07:49","modified_gmt":"2010-10-06T04:07:49","slug":"real-time-monitoring-of-angstrom-scale-surface-roughness","status":"publish","type":"post","link":"https:\/\/www.nanotec.or.th\/en\/real-time-monitoring-of-angstrom-scale-surface-roughness\/","title":{"rendered":"Real-time monitoring of angstrom-scale surface roughness"},"content":{"rendered":"<p>Many studies have reported surface roughness  measurements using contact methods such as atomic force microscopy  (AFM). However, although this approach can determine surface roughness  with sub-nanometer resolution, it is a time-consuming process. Now, a  simple non-contact method, based on the detection of scattered light  intensity during near-field etching, has been revealed that provides <em>in situ<\/em> real-time monitoring of changes in surface roughness with angstrom resolution.<\/p>\n<div>\n<div style=\"text-align: center;\"><img fetchpriority=\"high\" decoding=\"async\" class=\"alignnone size-full wp-image-385\" title=\"Near-field etching analysis\" src=\"http:\/\/www.nanotec.or.th\/en\/wp-content\/uploads\/2010\/10\/image11.jpg\" alt=\"Near-field etching analysis\" width=\"375\" height=\"305\" \/><\/div>\n<div style=\"text-align: center;\">Near-field etching analysis<\/div>\n<p>A team of scientists from the University of Tokyo, SIGMA KOKI, and  the National Institute of Information and Communications Technology  (NICT), has developed a non-contact self-organized method of near-field  etching that can reduce surface roughness, R<sub>a<\/sub>, to 1.36\u00a0\u00c5.  This represents a significant advance in the state of the art, as  surface roughness below 2\u00a0\u00c5 has not been demonstrated using conventional  chemical-mechanical polishing. More recently, the team performed  real-time monitoring of surface roughness during its optical near-field  etching process by measuring the intensity of light scattered from the  sample.<\/p>\n<p>To their surprise, this method can detect changes in surface  roughness with angstrom resolution. Furthermore, it yields in-plane  information about the surface as well as the surface roughness.  Comparison of the etching-time dependence of the surface roughness and  the power spectrum revealed that near-field etching not only decreased  the surface roughness, but also increased the number of scatterers,  which was confirmed using AFM. Because the intensity of scattered light  decreases with decreasing surface roughness, it should be noted that the  flattened substrate has a higher laser-damage threshold due to the  reduction of scattered loss at the surface.<\/p>\n<p>As this non-contact method does not require a polishing pad, it  can be applied not only to flat substrates but also to three-dimensional  substrates, which can have convex or concave surfaces, such as  micro-lenses and the inner-wall surfaces of cylinders. Further  optimization of the etching parameters (wavelength, power density and  etching time) should provide scope for an additional reduction in  surface roughness. The scientists believe that their latest results, published in the journal <em>Nanotechnology<\/em>, will accelerate commercialization of this new technique.<\/p>\n<\/div>\n<div id=\"aboutTheAuthor\">\n<h3>About the author<\/h3>\n<p>This study was conducted by research teams from the University of  Tokyo, SIGMA KOKI Co, Ltd, and the National Institute of Information and  Communications Technology, in Tokyo, Japan. The teams are part of a  collaborative research unit funded by the New Energy and Industrial  Technology Development Organization (NEDO), which is focused on the  formation of ultra-flat surfaces using optical near-field techniques.  Prof. Takashi Yatsui (University of Tokyo) managed the research and  analysed the data obtained by Kazuya Hirata (SIGMA KOKI Co, Ltd), who  performed the near-field etching and atomic force microscopy  experiments. Prof. Motoichi Ohtsu is head of the Nanophotonics Research  Center at the University of Tokyo and guided the project. Yoshinori  Tabata (SIGMA KOKI Co, Ltd), Dr Wataru Nomura and Prof. Tadashi Kawazoe  (University of Tokyo), and Prof. Makoto Naruse (University of Tokyo and  National Institute of Information and Communications Technology) were  involved in the discussion of results and contributed to the manuscript.<\/p>\n<\/div>\n<p><strong>Sources<\/strong>: http:\/\/nanotechweb.org\/cws\/article\/lab\/43766<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Many studies have reported surface roughness measurements using contact methods such as atomic force microscopy (AFM). However, although this approach [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"","adv-header-id-meta":"","stick-header-meta":"","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"default","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"footnotes":""},"categories":[34],"tags":[],"class_list":["post-29260","post","type-post","status-publish","format-standard","hentry","category-technology-update"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.5 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Real-time monitoring of angstrom-scale surface roughness - National Nanotechnology Center<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.nanotec.or.th\/en\/real-time-monitoring-of-angstrom-scale-surface-roughness\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Real-time monitoring of angstrom-scale surface roughness - National Nanotechnology Center\" \/>\n<meta property=\"og:description\" content=\"Many studies have reported surface roughness measurements using contact methods such as atomic force microscopy (AFM). 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